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31. May 2012 | Press Releases

JENOPTIK expands high power laser production with new AIXTRON system

AIXTRON SE today announced a new MOCVD systems order from existing customer JENOPTIK Diode Lab GmbH in Germany. The contract is for one AIX 2600G3 IC MOCVD reactor in a 12x4-inch wafer configuration to form the basis of a new capacity expansion for high power semiconductor laser diode epitaxial materials at JENOPTIK’s Lasers & Material Processing Division.

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11. May 2012 | Press Releases

Dow Corning orders additional AIXTRON SiC Planetary Reactor systems

Further expansion due to growing SiC demand

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08. May 2012 | Press Releases

University of Warsaw Adds AIXTRON CCS Reactor for Gallium Nitride Research

AIXTRON SE today announced a new MOCVD system order from the University of Warsaw, Poland. The contract is for one Close Coupled Showerhead (CCS) reactor in a 3x2-inch wafer configuration, to be used for the growth of gallium nitride (GaN) materials.

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03. May 2012 | Press Releases

FOREPI Places Repeat Order for AIXTRON CRIUS II-XL and G5 HT Systems

AIXTRON SE today announced that long-time customer Formosa Epitaxy Inc. (FOREPI) has placed a new order for several MOCVD systems. The order is made up of four CRIUS II-XL systems in a 19x4-inch wafer configuration as well as two G5 HT reactors in a 14x4-inch wafer configuration, which are to be used for the manufacturing of ultra-high brightness (UHB) GaN-based blue and white LEDs.

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