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31. July 2012 | Press Releases

Finisar places repeat order for AIXTRON G4 system

AIXTRON SE today announced a new MOCVD system order from Finisar Corporation, USA, a market leader in high-speed optical data communications. The order is for one AIX 2800G4-TM automated reactor dedicated to the growth of indium phosphide materials for lasers and detectors.

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24. July 2012 | Press Releases

AIXTRON Introduces AIX G5+

5x200 mm GaN-on-Si Technology for the AIX G5 Reactor Platform

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17. July 2012 | Press Releases

EpiGaN Successfully Starts 8-inch GaN-on-Si Development on AIXTRON Reactors

AIXTRON SE today announced that EpiGaN, a new customer and a start-up manufacturer of III-Nitrides epitaxial material in Hasselt, Belgium, has successfully commissioned two new MOCVD systems, able to operate either in multiple 6” or in 8” configuration.

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10. July 2012 | Press Releases

TRUMPF Photonics Selects AIXTRON AIX 2800G4-TM System

AIXTRON SE today announced that TRUMPF Photonics, located in Princeton, NJ, USA has taken delivery of an AIXTRON AIX 2800G4-TM MOCVD reactor for high power laser applications.

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05. July 2012 | Press Releases

TECHNOTUBES Project – AIXTRON Launches New BM 300T Carbon Nanotubes System

AIXTRON SE today announced the successful conclusion of the European Commission-funded “TECHNOTUBES” (Technology for Wafer-Scale Carbon Nanotubes) project, with a demonstration of its new automated growth equipment, BM 300T. The aim of the 3-year project was to develop growth processes, automated equipment, quality control/monitoring and a variety of end-applications based on carbon nanotubes. The members of the project consortium were the University of Cambridge (coordinator), ETH Zurich, TU Denmark, TU Berlin, Fritz Haber Institute, CNR-Italy, Philips, THALES, Cambridge CMOS Sensors, IMEC, and AIXTRON.

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