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17. March 2011 | Press Releases

Beiji Haotian Technology upgrades power LED epi capacity with AIXTRON G4 and G5 systems

AIXTRON SE today announced an order for MOCVD reactors from new customer Beiji Haotian Technology Co., Ltd. The order for a total of five systems comprises two AIX 2800G4 HT deposition systems in the 42x2-inch configuration and three AIX G5 HT deposition systems in the 56x2-inch configuration. The Jiangsu, China-based company placed the order during the second quarter of 2010 and following delivery between the first and second quarter of 2011, the systems will be used for production of power chip LEDs.

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10. March 2011 | Press Releases

The CRP – Gabriel Lippmann from Luxembourg and AIXTRON explore novel markets with advanced polymer thin films

The Centre de Recherche Public (CRP) - Gabriel Lippmann, the leading research institute in Nanotechnologies in Luxembourg, and AIXTRON SE announced today the start of a cooperation agreement. The main goal of the new project is the mutual development of advanced polymer materials focusing on establishing a wide range of processes that contribute to the fabrication of advanced organic/inorganic materials.

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08. March 2011 | Press Releases

Finisar Corporation purchases AIXTRON MOCVD technology for next generation VCSEL production

AIXTRON SE today announced a new order for an MOCVD reactor from Finisar Corporation, USA, a company engaged in the manufacture of fiber optic subsystems and components for communication applications.

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24. February 2011 | Press Releases

Hong Kong University of Science and Technology to use AIXTRON CCS reactor for III/Vs on Silicon research

AIXTRON SE announced today that its Close Coupled Showerhead MOCVD Platform, a CRIUS CCS reactor in the 6x2-inch (3x3-inch or 1x6-inch) wafer configuration, has been ordered by the Hong Kong University of Science and Technology (HKUST).

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