DEPOSITION SYSTEM FOR COMPOUND SEMICONDUCTORS

AIX 2800G4-TM (IC2)

“The best reactor for HVM of GaAs/InP based Optoelectronics and RF applications”

Key Benefits

  • Best Deposition Uniformity Control – at wafer level
  • Lowest Particle Count
  • Highest Product Yield
  • Lowest Production Cost

Product Features

  • Unique true horizontal flow Planetary Reactor – Built in best uniformity & highest efficiency
  • All graphite process chamber – lowest particles and highest repeatability performance
  • Triple process gas injection – maxed out yield optimization
  • Single wafer rotation – combining batch chamber productivity with single chamber tunability
  • Automated satellite loading at high temperature– highest throughput, lowest particles

Configurations

  • 15x4 inch
  • 8x6 inch

AIX 2800G4-TM (IC2)

Your contact person

Marketing

Vincent Meric

Vice President Marketing

Service

AIXTRON SE (Headquarters)

AIXTRON 24/7 Technical Support Line

AIXTRON Europe

AIXTRON Ltd (UK)

AIXTRON K.K. (Japan)

AIXTRON Korea Co., Ltd.

AIXTRON Taiwan Co., Ltd. (Main Office)

AIXTRON Inc. (USA)

Products

Vincent Meric
Vice President Marketing

Career

Laura Preinich
Recruiter

Tom Lankes
Talent Acquisition Expert- Ausbildungsleitung

Sustainability

Christoph Pütz
Senior Manager ESG & Sustainability

Company & Investor Relations

Christian Ludwig
Vice President

Ralf Penner
Senior IR Manager

Press & Public Relation

Ragah Dorenkamp
Director Corporate Communications

Research & Development

Prof. Dr. Michael Heuken
Vice President Advanced Technologies