14. August 2012 | Compound Semiconductors
AIXTRON SE today announced a new MOCVD system order from National Central University (NCU) in Taiwan. Existing customer, NCU has placed an order for one 1x6-inch AIXTRON Close Coupled Showerhead MOCVD system, which will be dedicated to the growth of GaN epitaxial structures on 6-inch silicon substrates, for use in the research and development of power management devices.
AIXTRON’s local support team has installed and commissioned the new reactor in the state-of-the-art cleanroom facility at NCU’s Microwave and Optoelectronic Devices Laboratory.
Professor Jen-Inn Chyi, Chair Professor of Electrical Engineering at the National Central University of Taiwan, comments, “Demand for low-cost GaN-based power devices in high-efficiency and high-power systems continues to increase. To satisfy this need we therefore plan to transfer our specially developed semiconductor materials technology to industry, for a pilot initially, and then for large-scale production. In order to succeed in this venture, the very best deposition equipment will be required, such as the AIXTRON multi-wafer MOCVD system on order. This system is an excellent match for the heteroepitaxial growth of gallium nitride structures on large area silicon wafers, with a view to providing high-performance devices as cost-efficiently as possible. Furthermore, the excellent reputation of the AIXTRON support service gives us great confidence for this very important new project.“
The National Central University (NCU) of Taiwan has a strong global reputation for research and academic excellence. Through its cooperative education programs and research projects, cutting-edge research and innovative learning, NCU will remain a first-rate university in Taiwan and worldwide. NCU research programs are wide ranging and include complex systems, liquid-crystals, neural networks, phonon and photon lattices, semiconductors, magnetic thin-films and superconductivity.
Our registered trademarks: AIXACT®, AIXTRON®, Atomic Level Solutions®, Close Coupled Showerhead®, CRIUS®, EXP®, EPISON®, Gas Foil Rotation®, Optacap™, OVPD®, Planetary Reactor®, PVPD®, STExS®, Trijet®
Christian Ludwig
Vice President Investor Relations & Corporate Communications
Alan Tai
Taiwan/Singapore
Christof Sommerhalter
USA
Christian Geng
Europe
Hisatoshi Hagiwara
Japan
Nam Kyu Lee
South Korea
Wei (William) Song
China
AIXTRON SE (Headquarters)
AIXTRON 24/7 Technical Support Line
AIXTRON Europe
AIXTRON Ltd (UK)
AIXTRON K.K. (Japan)
AIXTRON Korea Co., Ltd.
AIXTRON Taiwan Co., Ltd. (Main Office)
AIXTRON Inc. (USA)
Laura Preinich
Recruiter
Tom Lankes
Talent Acquisition Expert- Ausbildungsleitung
Christoph Pütz
Senior Manager ESG & Sustainability
Christian Ludwig
Vice President Investor Relations & Corporate Communications
Ralf Penner
Senior IR Manager
Christian Ludwig
Vice President Investor Relations & Corporate Communications
Prof. Dr. Michael Heuken
Vice President Advanced Technologies