02. March 2016 | Compound Semiconductors

Plessey expands production capacity with AIX G5+ C cluster from AIXTRON

AIXTRON Planetary technology enables best-in-class GaN-on-Si manufacturing

AIXTRON SE (FSE: AIXA; NASDAQ: AIXG), a worldwide leading provider of deposition equipment to the semiconductor industry, today announced that Plessey Semiconductors Ltd. has ordered an AIX G5+ C cluster system for the production capacity expansion of gallium nitride LEDs manufactured on silicon wafers (GaN-on-Si). The tool is scheduled for delivery in the third quarter 2016.

The AIX G5+ C cluster for Plessey consists of two multi-wafer AIX G5+ reactors which are supplemented by AIXTRON’s next generation cassette-to cassette handler for large-scale, fully automated epitaxy production. Plessey purchased the AIXTRON planetary system mainly for the expansion of their 150 mm GaN-on-Si wafer production but also works towards 200 mm production qualification mid-term as AIXTRON’s G5+ system enables the processing of eight 150 mm wafers or five 200 mm wafers at the same time.

Mike Snaith, Operations Director at Plessey, said: “We are now moving from proof of capability for our GaN-on-Si LED products into a capacity expansion phase. In the meantime, we have built significant demand for a range of our LED products. We have decided to purchase AIXTRON’s latest planetary system as the AIX G5+ C combines outstanding on-wafer uniformity and run-to-run performance at lowest cost of ownership – aspects that are crucial for efficient high-volume GaN-on-Si production.”

Dr. Frank Schulte, Vice President AIXTRON Europe, comments: “We have a longstanding and trustful relationship with Plessey and therefore, we are delighted by the renewed order. Our AIX G5+ C planetary system resolves the common challenges of high-yield, high-quality and high-throughput production of GaN-based materials on large-area silicon wafers through its fully automated cassette-to-cassette loader and a thermally activated gas etch of the MOCVD chamber.”

Download press release

Our registered trademarks: AIXACT®, AIXTRON®, Atomic Level Solutions®, Close Coupled Showerhead®, CRIUS®, EXP®, EPISON®, Gas Foil Rotation®, Optacap™, OVPD®, Planetary Reactor®, PVPD®, STExS®, Trijet®

Your contact person

Christian Ludwig

Vice President Investor Relations & Corporate Communications

Phone: +49 (2407) 9030-444

Send e-mail
Xing
LinkedIn

Service

AIXTRON SE (Headquarters)

AIXTRON 24/7 Technical Support Line

AIXTRON Europe

AIXTRON Ltd (UK)

AIXTRON K.K. (Japan)

AIXTRON Korea Co., Ltd.

AIXTRON Taiwan Co., Ltd. (Main Office)

AIXTRON Inc. (USA)

Products

Vincent Meric
Vice President Marketing

Career

Laura Preinich
Recruiter

Tom Lankes
Talent Acquisition Expert- Ausbildungsleitung

Sustainability

Christoph Pütz
Senior Manager ESG & Sustainability

Investor Relations

Christian Ludwig
Vice President Investor Relations & Corporate Communications

Ralf Penner
Senior IR Manager

Press & Public Relations

Christian Ludwig
Vice President Investor Relations & Corporate Communications

Research & Development

Prof. Dr. Michael Heuken
Vice President Advanced Technologies