AIXTRON AG: New R&D facilities planned

AIXTRON AG / Strategic Company Decision

27.01.2010 

Dissemination of a Corporate News, transmitted by
DGAP - a company of EquityStory AG.
The issuer / publisher is solely responsible for the content of this announcement.

---------------------------------------------------------------------------

AIXTRON expands to new R&D facilities

Aachen-Herzogenrath/Germany, January 27, 2010 - AIXTRON AG (FSE: AIXA, ISIN
DE000A0WMPJ6; NASDAQ: AIXG, ISIN US0096061041) today announced an important
step in the implementation of its accelerated Research and Development
strategy by building a new state of the art R&D campus at its premises in
Herzogenrath-Kohlscheid in support of the company's Research and
Development strategy.

The new facility will be able to host up to 350 engineers at the end of
phase 1, significantly increasing the laboratory resources and prototype
capabilities used to develop next generation complex material deposition
manufacturing systems. To fully develop these new modular cutting edge
facilities, AIXTRON plans to invest up to EUR40m over the next 2-3 years.
The new facilities will utilize a renewable energy design to minimize its
carbon footprint.

AIXTRON will continue to focus the principal manufacturing of standard
deposition equipment at its nearby main facilities in Herzogenrath,
Kaiserstraße, supported by the engineering and assembly locations in
Cambridge, UK, and Sunnyvale, US.

Paul Hyland, Chief Executive Officer of AIXTRON AG, comments: 'This is a
vitally important next step in the implementation of our product
development strategy and the accelerated timing reflects the recent
increase in volume and momentum we have seen in the markets we serve. It
also underlines our commitment to deliver continuous improvement to the
productivity of our products for our customers.

Looking at our near-term objectives; the requirement to meet the improved
performance and reduced cost of ownership objectives necessary to support
needs of the emerging LED general lighting market will require significant
focus and commitment. This new facility will further increase our ability
to be able to deliver both of these requirements.

AIXTRON's acknowledged market leadership is built on our renowned
technology leadership. As we go into a very exciting period of innovation
and growth, it is our firm intention to step up a gear to maintain our
position of being always one step ahead.'

For further information on AIXTRON AG (FSE: AIXA, ISIN DE000A0WMPJ6;
NASDAQ: AIXG, ISIN US0096061041) please consult our website at:
www.aixtron.com.


Contact:
Investor Relations and Corporate Communications
AIXTRON AG, Kaiserstr. 98, 52134 Herzogenrath, Germany
Phone: +49 241 8909 444, Fax: +49 241 8909 445, invest@aixtron.com
www.aixtron.com






27.01.2010  Ad hoc announcement, Financial News and Media Release distributed by DGAP.
Media archive at www.dgap-medientreff.de and www.dgap.de

---------------------------------------------------------------------------
 
Language:     English
Company:      AIXTRON AG
              Kaiserstr. 98
              52134 Herzogenrath
              Deutschland
Phone:        +49 (241) 8909-444
Fax:          +49 (241) 8909-445
E-mail:       invest@aixtron.com
Internet:     www.aixtron.com
ISIN:         DE000A0WMPJ6, US0096061041
WKN:          A0WMPJ
Indices:      TecDAX
Listed:       Regulierter Markt in Frankfurt (Prime Standard); Freiverkehr
              in Berlin, München, Düsseldorf, Stuttgart; Terminbörse EUREX;
              Foreign Exchange(s) Nasdaq
 
End of News                                     DGAP News-Service
 
---------------------------------------------------------------------------

Our registered trademarks: AIXACT®, AIXTRON®, Atomic Level Solutions®, Close Coupled Showerhead®, CRIUS®, EXP®, EPISON®, Gas Foil Rotation®, Optacap™, OVPD®, Planetary Reactor®, PVPD®, STExS®, Trijet®