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01. August 2017 | Compound Semiconductors
Novel process chamber design enables enhanced fabrication of high performance Deep UV LEDs
AIXTRON SE (FSE: AIXA), a worldwide leading provider of deposition equipment to the semiconductor industry, announced today that globally leading Chinese optoelectronics manufacturer San’an has successfully completed the qualification of AIXTRON’s novel Close Coupled Showerhead (CCS) process chamber designed for the production of Deep Ultra Violet (DUV) LEDs.
The new process chamber is based on AIXTRON’S well proven CCS technology. It is the first commercially available MOCVD reactor that offers the extremely high process temperatures as needed for the production of DUV LEDs. The enhanced chamber performance facilitates cost-efficient high volume manufacturing of DUV LEDs as used for water and air purification. The configuration of 19 x 2-inch wafers represents the largest capacity currently available in the market for this high end MOCVD application.
Dr. Ryan Chuo, Vice President of Technology Center, San’an Optoelectronics, comments: „The new AIXTRON CCS reactor design is a key enabling factor for San’an producing next generation DUV LED products with higher quantum efficiencies and significantly higher output powers. Already being one of the largest suppliers for LEDs, AIXTRON’s newly designed process chamber perfectly supports our strategic targets in the area of DUV LEDs to further strengthen our industry leadership. Therefore, we are very pleased to be the first company to qualify and utilize AIXTRON’s new reactor kit.”
Our registered trademarks: AIXACT®, AIXTRON®, Atomic Level Solutions®, Close Coupled Showerhead®, CRIUS®, EXP®, EPISON®, Gas Foil Rotation®, Optacap™, OVPD®, Planetary Reactor®, PVPD®, STExS®, Trijet®
Christian Ludwig
Vice President Investor Relations & Corporate Communications
Alan Tai
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Christian Geng
Europe
Hisatoshi Hagiwara
Japan
Nam Kyu Lee
South Korea
Wei (William) Song
China
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