- / HOME
- / Investors
07. November 2019 | Press Releases
AIX G5 WW C offers best-in-class production quality at lowest cost
Herzogenrath/Germany, 07 November, 2019 – AIXTRON SE (FSE: AIXA), a worldwide leading provider of deposition equipment to the semiconductor industry, today announced that it has provided an AIX G5 WW C system to EpiWorld International Co., Ltd for the further development of next generation silicon carbide (SiC) epitaxial wafers mainly used for the manufacturing of power devices for automotive applications. The shipment and installation of AIXTRON’s high-volume manufacturing system to EpiWorld’s cleanroom facilities in Xiamen, China, has been conducted in Q3/2019.
The AIX G5 WW C MOCVD tool is based on AIXTRON’s production-proven, fully-automated Planetary Reactor® platform disposing the largest batch capacity and highest throughput in the industry. The system offers flexible 6-inch or 4-inch configurations with the design aiming at squeezing production costs to a minimum, while maintaining excellent production quality.
EpiWorld seeks to further expand its production capacity to meet the increasing demand by customers. A leading China-based producer, the company has already completed production lines for 4- and 6-inch SiC epitaxial wafers for making 600V, 1,200V and 1,700V power devices.
“In recent years, we have been qualified as a leading supplier of SiC epitaxy wafers by device manufacturers in the automotive and various other sectors. Therefore, we have a strong footprint in one of the most challenging industries. We had so far served over 100 customers around the world. With this new addition, our annual capacity will be increased to 60,000 wafers in 2019. Our recently completed phase I expansion of an 18,000 square meters new facility is designed to provide manufacturing space for an annual capacity of up to 400,000 wafers. As we and our customers have high quality standards, we rely on industry leaders such as AIXTRON and their proven system technology to meet these requirements appropriately. We are looking forward to launch the high-volume production of our SiC epitaxial wafers with the AIX G5 WW C”, says Dr. Gan Feng, General Manager of EpiWorld.
Dr. Felix Grawert, President of AIXTRON SE, comments: “We are delighted to cooperate with one of the leading epitaxy foundries to accelerate the further commercialization of silicon carbide. Silicon carbide will support the development of numerous high-end power electronics applications, meaning that we are paving the way for megatrends such as e-mobility or renewable energy.”
Our registered trademarks: AIXACT®, AIXTRON®, Atomic Level Solutions®, Close Coupled Showerhead®, CRIUS®, EXP®, EPISON®, Gas Foil Rotation®, Optacap™, OVPD®, Planetary Reactor®, PVPD®, STExS®, Trijet®
Christian Ludwig
Vice President Investor Relations & Corporate Communications
Alan Tai
Taiwan/Singapore
Christof Sommerhalter
USA
Christian Geng
Europe
Hisatoshi Hagiwara
Japan
Nam Kyu Lee
South Korea
Wei (William) Song
China
AIXTRON SE (Headquarters)
AIXTRON 24/7 Technical Support Line
AIXTRON Europe
AIXTRON Ltd (UK)
AIXTRON K.K. (Japan)
AIXTRON Korea Co., Ltd.
AIXTRON Taiwan Co., Ltd. (Main Office)
AIXTRON Inc. (USA)
Laura Preinich
Recruiter
Tom Lankes
Talent Acquisition Expert- Ausbildungsleitung
Christoph Pütz
Senior Manager ESG & Sustainability
Christian Ludwig
Vice President Investor Relations & Corporate Communications
Ralf Penner
Senior IR Manager
Christian Ludwig
Vice President Investor Relations & Corporate Communications
Prof. Dr. Michael Heuken
Vice President Advanced Technologies